Rapid annealing furnace is a kind of cutting-edge heat treatment equipment, and its function is mainly reflected in the following aspects: 

First, eliminate defects and improve performance: the fast annealing furnace uses halogen infrared lamp as a heat source to quickly heat wafers or other materials to 300C-1250 ℃ through extremely fast heating rate, so as to eliminate some internal defects of the materials. improve the performance of the product. 

Second, precise temperature control, uniform heating: the fast annealing furnace adopts advanced microcomputer control system, through PID closed-loop temperature control, can achieve very high temperature control accuracy and temperature uniformity. 

This accurate temperature control is very important to improve the quality and performance of the product. 

Third, wide application and strong adaptability: rapid annealing furnace is widely used in the production of many kinds of chip products, such as IC wafers, LED wafers, MEMS, compound semiconductors and power devices, as well as ohmic contact fast alloy, ion implantation annealing, oxide growth, stress relief and densification. 

In addition, it can also be used for annealing of metal materials, glass materials, ceramic materials, polymer materials and other materials, with greater adaptability and flexibility. 

Fourth, high efficiency and energy saving, high degree of automation: fast annealing furnace has the characteristics of high efficiency and energy saving, and can complete annealing treatment in a relatively short time. 

At the same time, it also has the advantage of a high degree of automation, can achieve automatic control and monitoring, and improve production efficiency and quality. 

Generally speaking, rapid annealing furnace is an efficient, accurate and widely used heat treatment equipment, which plays an important role in improving the quality and performance of products.