Category：Plasma Glue Remover
Can remove photoresist in BAW/SAW process, equipped with two types of single cavity and double cavity
The ICP dry plasma adhesive remover is mainly used for polymer removal, ASKING, DESCUM, ion implantation induced photoresist removal, surface residue removal, etc. ST3100 chamber is suitable for 4-8 inch samples, with one piece for single processing; The ST3200 chamber is suitable for 4-8 inch samples, with a single processing of 2 pieces.
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